Dresden 2006 – wissenschaftliches Programm
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CPP: Chemische Physik und Polymerphysik
CPP 27: POSTER Polymer Physics and Materials
CPP 27.15: Poster
Donnerstag, 30. März 2006, 17:00–19:00, P2
AFM-Nanolithography on self-assembled monolayers — •Harald Graaf1, Maik Vieluf1, Masato Ara2, and Hirokazu Tada2 — 1Optische Spektroskopie und Molekülphysik, Institut für Physik, Technische Universität Chemnitz, 09107 Chemnitz — 2Division of Materials Physics, Graduate School of Engineering Science, Osaka University, Osaka 560-8531 JAPAN
We report on the anodic oxidation of self-assembled monolayers (SAM) on silicon surfaces by Atomic Force Microscopy (AFM). These SAM are prepared by heat-induced chemical reaction of an alkene with a hydrogen terminated silicon surface. They are characterized by a high order of the molecules and a strong physical as well as chemical stability. By varying the headgroup of the alkenes the properties of the surface can be easily tuned, e.g. from hydrophobic to hydrophilic. By anodic oxidation the SAM can be locally degraded and the below silicon oxidized leading to silicon oxide nanostructures. These silicon oxide structures can either be modified by attaching different Silane molecules or can be selectively removed by chemical etching followed by chemical modification of the formed ditch.