Dresden 2006 – wissenschaftliches Programm
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DF: Dielektrische Festkörper
DF 3: Poster Session
DF 3.19: Poster
Montag, 27. März 2006, 09:30–17:00, P1
Fabrication and characterization of the electrical and dielectrical properties of thin insulating films for the application in superconducting devices — •Veit Grosse1, Ralf Bechstein1, Robert Pietzcker1, Frank Schmidl1, Ingo Uschmann2, and Paul Seidel1 — 1Institut für Festkörperphysik, Friedrich-Schiller-Universität Jena, Helmholtzweg 5, D-07743 Jena — 2Institut für Optik und Quantenelektronik, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, D-07743 Jena
Thin dielectric films of strontium titanate (STO) as well as zinc oxide (ZnO) were deposited on YBa2Cu3O7−x-layers on STO-substrates by Pulsed Laser Deposition. In the case of STO, X-Ray investigations showed good crystalline quality and orientation in c-direction due to the good match of the lattice parameter. First results to the epitaxial growth of ZnO will be presented. With regard to the application in superconducting devices the electrical and dielectrical properties of these films were investigated on capacitor-like structures. The time of oxygen annealing after deposition and the material of the top electrode (e.g. YBCO, Au) were varied to analyse the influence of these factors on the conduction process. We also investigated the dependence of the dielectric permittivity on temperature in the range from 300 to 4.2 K and on a electric bias field. We compare these results with measurements on amorphous insulating films (e.g. SiO2, CeOX) in Au/isulator/Au-systems.