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Dresden 2006 – wissenschaftliches Programm

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DS: Dünne Schichten

DS 20: Ion beam induced nanostructures

Donnerstag, 30. März 2006, 14:00–16:15, GER 37

14:00 DS 20.1 Hauptvortrag: Nanostructures by grazing incidence ions: ripple patterns, athermal coarsening and subsurface channeling — •Thomas Michely
14:45 DS 20.2 Self-organized pattern formation on Si and Ge surfaces during low-energy ion beam erosion — •Frank Frost, Bashkim Ziberi, and Bernd Rauschenbach
15:00 DS 20.3 Formation of nanopatterns induced by low-energy ion sputtering of Si surfaces — •Frank Rotter, Kun Zhang, Carsten Ronning, Hans Hofsäss, Michael Uhrmacher, and Johann Krauser
15:15 DS 20.4 In-situ X-Ray Diffraction of GaSb Nanopatterned by Normal Incidence Sputter Erosion — •Adrian Keller, Stefan Facsko, Olivier Plantevin, Dina Carbone, Hartmut Metzger, and Raul Gago
15:30 DS 20.5 Ripple to dot transition on Si and Ge surfaces by ion beam erosion — •Bashkim Ziberi, Frank Frost, Dina Carbone, Hartmut Metzger, and Bernd Rauschenbach
15:45 DS 20.6 Ion sputtering induced surface nanostructuring of ferromagnetic thin films — •Kun Zhang, Frank Rotter, Carsten Ronning, Hans Hofsäss, Michael Uhrmacher, and Johann Krauser
16:00 DS 20.7 Self-organized nanoscale multilayer growth during the deposition of hyperthermal species — •Hayo Zutz, Inga Hannstein, Carsten Ronning, Michael Seibt, Hans Hofsäss, Wan-Yu Wu, and Jyh-Ming Ting
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