Dresden 2006 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe
DS: Dünne Schichten
DS 21: Laser and plasma processes
DS 21.5: Vortrag
Donnerstag, 30. März 2006, 17:30–17:45, GER 37
Determination of plasma parameters during deposition of ZnO-films with ceramic and metallic targets and correlation with film parameters — •Ruben Wiese1, Holger Kersten1, Florian Ruske2, Volker Sittinger2, Richard Menner3, and Mario Hannemann1 — 1INP Greifswald — 2IST Braunschweig — 3ZSW Stuttgart
At ZnO-film sputter deposition, the plasma parameters essentially determine the physical properties of the deposited films. In the present case, the energy flux to the substrate was measured with special thermal probes. A thermally isolated substrate dummy was placed in the magnetron plasma at the position of the substrate. By the temporal behavior of the probe one can obtain the energy flux to the surface. Furthermore, it is possible to apply a substrate bias, whereby the energy flux of the charge carriers can be estimated. To determine further plasma parameters, Langmuir-probes were placed in the substrate region. The probes could be moved across the target axis, and thus, the profile of the parameters in the substrate plane across the target could be determined. For comparable sputter conditions, so called static prints were prepared to measure the film property profile across the target axis. By comparison of spatially measured plasma parameter profile across the target axis in the substrate level with the profile of the film properties, correlations could be obtained. Particularly, being aware of the thickness profile, the energy influx per deposited particle was estimated and a correlation with the film properties is discussed. The measurements have been carried out with ceramic targets as well as in reactive processes with metallic targets.