Dresden 2006 – wissenschaftliches Programm

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DS: Dünne Schichten

DS 22: Thin film deposition and process characterization II

DS 22.1: Vortrag

Donnerstag, 30. März 2006, 14:00–14:15, GER 38

Functionalising of Tips for Scanning Probe Microscopy — •Danny Kowerko, Falk Müller, Andi Käppel, Steffen Schulze, and Michael Hietschold — TU Chemnitz, Institut für Physik

Throughout the last 15 years different material deposition techniques have become powerful tools for creating nanodots, nanowires, nanotips and nanolayers. In this work the application potential of EBID-(Electron Beam Induced Deposition)-nanotips as probes for SPM (scanning probe microscopes) will be discussed. A precursor material is sublimated and aligned by dint of a needle close to a silicon substrate or an AFM-Cantilever. A fine focused electron beam dissociates the adsorbed molecules and a tip will be generated. The influence of secondary electron-distribution, surface diffusion and dissociation energies of the precursor materials like tungstenhexacarbonyl (W(CO)₆) hint at the chances and limits of forming SPM tips on different surface geometries such as AFM-Cantilevers. As a possibility to overcome the current density limitation at usual SEMs, field emission induced deposition (FEID) is mentioned for fabrication of sub-10-nm-deposits consisting of highly conducting or magnetic material. Therefore FEID-whisker growth at the apex of STM-tips can be exhibited.