Dresden 2006 – wissenschaftliches Programm
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DS: Dünne Schichten
DS 24: Poster presentation
DS 24.26: Poster
Dienstag, 28. März 2006, 15:00–17:30, P2
Substrate Temperature Control for Diamond Film Deposition — •Nicolas Wöhrl, Markus Degenhardt, and Volker Buck — Thin Film Technology Group, Dept. of Physics, University of Duisburg-Essen, Universitätsstr. 3-5, 45141 Essen, Germany
The substrate temperature is a critical process parameter for the deposition of diamond. A temperature above 500∘C is needed for a reasonable deposition rate and should not extend 1300∘C because above this temperature the films become more and more graphitic. Also the film properties are affected by the deposition temperature (e.g. morphology or residual stress).
Another important aspect of the diamond deposition is that the deposition rate of diamond films is scaling with the power used for the plasma. From this results that for high deposition rate the substrate must be cooled (For usual deposition rates mainly self-heating or even external heating are common). Therefore the control of the substrate temperature and an effective substrate cooling is crucial for the understanding of the deposition process and a high rate deposition of diamond.
Thus an aerosol water cooling of the substrate holder was build to meet the needs of the diamond deposition. The setup uses an IR-pyrometer to measure the substrate temperature.
The nanocrystalline diamond films shown in this work were deposited at different substrate temperatures from an Ar/H2/CH4 plasma in a MW-CVD plasma chamber. The performance of the aerosol water cooling and the influence of the substrate temperature on the film properties are shown.