Dresden 2006 – wissenschaftliches Programm

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DS: Dünne Schichten

DS 24: Poster presentation

DS 24.54: Poster

Dienstag, 28. März 2006, 15:00–17:30, P2

Temperature Controlled Deposition of Thin Plasma Polymer Films Containing Hydroxyl Groups — •Jan Schäfer and Jürgen Meichsner — Institute of Physics, Ernst-Moritz-Arndt-University of Greifswald, Domstraße 10a, D-17489 Greifswald

Thin functional plasma polymer films from ethylene glycol (EG) are deposited in the RF plasma reactor Nevada. The films are characterized by a high content of hydroxyl functional groups.

A mixture of EG vapour and argon was used as a reactive process gas system. By the IR Reflection Absorption Spectroscopy (IRRAS) of the temperature tuneable surface we characterised the (p,T)- phase diagram of the mixture. Following we localized that area of the diagram where an irreversible reaction process between the plasma and the EG liquid condensate results in the solid polymer film.

The in situ IRRAS was applied for an analysis of changes in the molecular structure of the films. Depending on the position in the phase diagram the molecular composition of the films varied, in particular the proportion between hydroxyl and carbonyl groups. This is in correlation with the temperature behaviour of the film during the plasma surface interaction.

The nature of the Poly(EG)-like films by means of the new deposition method is discussed concerning biochemical applications.