Dresden 2006 – wissenschaftliches Programm

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O: Oberflächenphysik

O 39: Nanostructures III

O 39.7: Vortrag

Donnerstag, 30. März 2006, 16:30–16:45, PHY C213

Nanopatterning by a Combination of Micellar and Conventional Lithographic Techniques — •Christian Pfahler, Sabrina Brieger, Oliver Dubbers, Achim Manzke, Alfred Plettl, and Paul Ziemann — Solid State Physics, University of Ulm, D-89069 Ulm, Germany

Diblock copolymers of PS-b-P2VP, dissolved in toluene, form reverse micelles comprised of a P2VP core and a PS corona. The core can be loaded with e.g. HAuCl4. By dip coating, these micelles are deposited onto substrates. Subsequently the polymer is removed and Au-nanoparticles are created in an isotropic Hydrogen plasma. This micellar technique was used to produce 14 nm Au nanoparticles with spacings of 100 nm, which form hexagonally well ordered arrays on Si. Some lithographic applications of these particles will be demonstrated: Deposited on Si wafers, they can be used directly as an etching mask for pillar fabrication by an anisotropic plasma etching process with a CF4/CHF3 gas mixture. In this way, heights of more than 100 nm and aspect ratios of 10 were achieved. It will further be demonstrated that the array of pillars can be transferred into a corresponding array of cylindrical holes which offer additional applications. A typical diameter of the cylindrical holes is less than 20 nm with an aspect ratio of 10. Both preparation techniques can be applied to amorphous Si films as well, which can be evaporated onto any insulating substrates or metallic films. By combining this approach with conventional ebeam lithography, one can position the micelles on the nanoscale. For this purpose, first metal or, in a new process route, resist templates have to be prepared lithographically.