Regensburg 2007 – wissenschaftliches Programm
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MA: Fachverband Magnetismus
MA 23: Micro- and Nanostructured Magnetic Materials I
MA 23.6: Vortrag
Donnerstag, 29. März 2007, 11:30–11:45, H22
Magnetic antidot arrays with perpendicular or in-plane magnetization orientation — •Sabine Pütter1, Holger Stillrich1, Andreas Frömsdorf2, and Hans Peter Oepen1 — 1Institut für Angewandte Physik, Jungiusstr. 11, 20355 Hamburg — 2Institut für Physikalische Chemie, Grindelallee 117, 20146 Hamburg
Hexagonal magnetic antidot arrays with periods below 100 nm are fabricated utilizing self organized patterns of diblock copolymer micelles as masks. Two methods for antidot array production in Co/Pt multilayers are presented. In the first method, the Co/Pt films are grown on top of the micelles preserving the morphology of the height modulated micelle pattern. Via Ar+ sputtering at grazing incidence the film on the micelle caps is removed. Alternatively, micelles filled with SiO2 are deposited on the magnetic film. Ion milling at normal incidence produces an antidot array due to preferred sputtering of the SiO2 cores.
Varying the Co or Pt thickness of the multilayers the easy axis of magnetization of the antidot array is tuned to be in-plane or out-of-plane. For ion milling at normal incidence, however, high Ar+ ion energies (> 500 eV) cause a reorientation of the magnetization from out-of-plane to in-plane during structuring.
We have investigated the morphology and topography of the arrays by SEM and AFM. The results of the afore mentioned studies are correlated with the magnetic behaviour observed via the magneto optical Kerr effect.
Funding by the DFG via SFB 508 is gratefully acknowledged.