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MM: Fachverband Metall- und Materialphysik

MM 22: SYM Physics meets Industry

MM 22.7: Talk

Wednesday, March 28, 2007, 17:00–17:20, H16

Surface analysis of technological relevant samples — •Andreas Thißen — Voltastr. 5, 13355 Berlin, Germany

Electronic devices have revolutionized everyday life in industrial countries over the last decades. Recently two main tasks for research and development are dominant: miniaturization for sophisticated applications targetting at the nanoscale, and designing low cost large scale devices. In both fields the device performance is strongly determined by materials* quality, composition, combination and last but not least by processes at materials* interfaces. Nanostructures, minimization of material consumption and the need to improve device efficiencies consequently leads to the widespread focussing on thin film preparation. For thin film devices surface and interface analysis like photoelectron spectroscopy is an important tool for material and device characterization. Classical well defined model experiments already reveal important insights using highly integrated vacuum systems for analysis and preparation. But analysis of materials and devices under near environmental conditions and even in situ during operation is an inevitable future development to improve the significance of data for development and quality management. In this respect techniques like high pressure XPS, XPS from liquids and hard x-ray PES (HAXPS) are some of the challenging tasks for manufacturing companies for surface analytical equipment.