Regensburg 2007 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 16: Organic, Polymeric, and Biomolecular Films I

O 16.10: Vortrag

Montag, 26. März 2007, 16:30–16:45, H42

Photothermal patterning of organic monolayers: Monolayers from fluorinated silanes and alkynes — •Benjamin Klingebiel, Steffen Franzka, Nils Hartmann, and Eckart Hasselbrink — Fachbereich Chemie, Universität Duisburg-Essen, Universitätsstraße 5, 45141 Essen

Organic monolayers offer great opportunities to modify the surface properties of solid substrates. Many advanced applications require patterned organic monolayers. Recently, we reported a simple photothermal procedure for patterning of alkylsiloxane monolayers grown on native silicon substrates [1]. A focused beam of an argon ion laser at a wavelength of 514 nm is used for rapid large-area patterning. Despite a laser spot diameter of about 2.5 microns line widths down to 200 nm are reached [1,2]. Here we present new results which focus on patterning of monolayers which are formed i) via coating of native silicon substrates in millimolar solutions of fluorinated silanes and ii) via hydrosilylation of H-terminated silicon substrates with long-chain alkynes. Similar to alkylsiloxane monolayers, these monolayers exhibit a high thermal and chemical stability. Hence, photothermal patterning, yields narrow lines with widths down to 300 nm and 400 nm, respectively. In order to determine the effective activation energies of the overall patterning process, the experimental data is analyzed considering a simple photothermal model.

[1] T. Balgar, S. Franzka, N. Hartmann, E. Hasselbrink, Langmuir 2004, 20, 3525 [2] D. Dahlhaus, S. Franzka, E. Hasselbrink, N. Hartmann, Nano Lett. 2006, 6, 2358