Regensburg 2007 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 44: Poster Session II (Semiconductors; Oxides and Insulators: Adsorption, Clean Surfaces, Epitaxy and Growth; Surface Chemical Reactions and Heterogeneous Catalysis; Surface or Interface Magnetism; Solid-Liquid Interfaces; Organic, Polymeric, Biomolecular Films; Particles and Clusters; Methods: Atomic and Electronic Structure; Time-resolved Spectroscopies)
O 44.51: Poster
Mittwoch, 28. März 2007, 17:00–19:30, Poster C
Atomic Force Microscopy studies on — •Jörn Wochnowski1, Thimo Göllnitz2, Germar Hoffmann2, Jürgen Heck1, and Roland Wiesendanger2 — 1Institute of Inorganic and Applied Chemistry, University of Hamburg — 2Institute of Applied Physics, University of Hamburg
The coating of temperature-sensitive substrates, e.g. vitreous substrates in the microtechnology with high melting point materials, is challenging. Organometallic chemical vapour deposition of volatile compounds is one solution. We have developed1 an experimental set-up for the deposition of elements (metals), element oxides and other functional composites in a glass microreactor (diameter: 70 µm or lower) and in mesoporous material. In a preliminary study numerous organometallic compounds as precursors have been tested as catalytic materials. The catalytic system (CrOx/SiO2) was successfully deposited in a glass microreactor by OMCVD of Cr(CO)6 as precursor for the catalyst and tetraethoxysilane as precursor for the SiO2 support. The deposited layers were investigated by REM and EDX. To study the surface morphology on the nanometer scale we employed Atomic Force Microscopy (AFM). Here, we will present our AFM investigations for surfaces prepared by organometallic chemical vapour deposition. We will discuss the preparation and the analysis of the surfaces with the focus to tailor material properties.
1 J. Heck, S. Kneip, A. Knöchel, M. Haller, F. Moritz, (FZ Karlsruhe GmbH), DE 19852722, EP 1001050 A2 (2000).