Regensburg 2007 – wissenschaftliches Programm
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SYOE: Symposium Organic Thin Film Electronics: From Molecular Contacts to Devices
SYOE 8: Poster Session SYOE
SYOE 8.49: Poster
Dienstag, 27. März 2007, 18:00–20:00, Poster B
Influence of chamber pressure and deposition rate on structural properties and surface morphology of amorphous OVPD processed films — •Phenwisa Niyamakom1, Maryam Beigmohamadi1, Azadeh Farahzadi1, Frank Jessen2, Holger Kalisch2, Rolf Jansen2, Nico Meyer3, Dietmar Keiper3, Martin Kunat3, Michael Heuken2,3, Christian Effertz1, Philip Schulz1, Holger Schwab4, Thomas Michely1, and Matthias Wuttig1 — 1Institute of Physics (IA), RWTH Aachen University of Technology, 52056 Aachen, Germany — 2Institute of Electromagnetic Theory, RWTH Aachen University of Technology, Kopernikusstr. 16, 52074 Aachen, Germany — 3AIXTRON AG, Kackertstr. 15-17, 52072 Aachen, Germany — 4Philips Technologie GmbH, Philipsstr. 8, 52066 Aachen, Germany
For Organic Light Emitting Devices (OLEDs), the absence of long-range order in amorphous films results in smooth surfaces and efficient radiative recombination, allowing for the realization of high performance organic optoelectronic devices. To tailor structure and morphology of these organic films, an understanding of the influence of deposition parameters, controlling film properties, is necessary. In this study, the Organic Vapor Phase Deposition (OVPD) was selected as the deposition technique. The influence of chamber pressure and deposition rate on α-NPD films on Si substrates has been investigated by Atomic Force Microscopy and X-Ray Reflectometry. A remarkable dependence of film roughness on these parameters has been observed. Models to account for this behavior will be presented.