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Berlin 2008 – scientific programme

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DS: Fachverband Dünne Schichten

DS 30: Layer Properties: Electrical, Optical and Mechanical Properties

Thursday, February 28, 2008, 09:30–11:00, H 2032

09:30 DS 30.1 Spectral ellipsometry of embedded VO2 nanoclusters in SiO2 during the semiconductor-metal transitionHelmut Karl, •Anne-Kathrin Jambreck, and Bernd Stritzker
09:45 DS 30.2 Stress-engineering and optical properties of SiO2 and TiO2 thin films grown by dual ion beam deposition — •Carsten Bundesmann, Inga-Maria Eichentopf, Stephan Mändl, and Horst Neumann
10:00 DS 30.3 Charge transport in nanoparticulate Zinc Oxide layers — •Simon Bubel, Donna Nikolova, Koshi Okamura, Norman Mechau, Roland Schmechel, and Horst Hahn
10:15 DS 30.4 Simulations on Grazing-Incidence Reflectometry in the XUV for Thin Film Structures — •Matus Banyay and Larissa Juschkin
10:30 DS 30.5 Co-deposition of energetic carbon and Copper ions: Self-organization of multilayers — •Hayo Zutz, Dominika Lyzwa, Inga Gerhards, Carsten Ronning, Michael Seibt, and Hans Hofsäss
10:45 DS 30.6 Determination of yield stress and elastic modulus under complete consideration of substrate influence demonstrated on a-C:H films — •Matthias Herrmann, Maksim Karniychuk, Siegfried Peter, and Frank Richter
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