Berlin 2008 – wissenschaftliches Programm

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MA: Fachverband Magnetismus

MA 7: Micro and Nanostructured Magnetic Materials II

MA 7.4: Vortrag

Montag, 25. Februar 2008, 16:00–16:15, EB 301

Magnetic correlations of nanostructures created by optical interference lithography on thin films — •Artur Glavic, Stefan Mattauch, and Thomas Brückel — Institut f. Festkörperforschung-Streumethoden, Forschungszentrum Jülich GmbH, 52425 Jülich

With increasing miniaturization, coupling effects between magnetic structures used in information technology become ever more important. In order to get a better understanding of these coupling mechanisms, we prepared as model systems laterally patterned epitaxial iron films consisting of stripes with periods between 500 nm and some µ m by optical interference lithography. Polarised neutron reflectometry is the method of choice to study magnetic correlations in these systems as one can separate atomic and magnetic scattering and as the lengths scales accessible by off specular scattering match quite well the periods mentioned.

The preparation of the samples by Molecular Beam Epitaxy MBE and interference lithography will be presented. The advantages of interference lithography for this application and the setup we build for this purpose will be shown. The methods of x-ray and polarised neutron reflectometry will be introduced, as well as the setup of the used neutron reflectometer, TREFF at the FRM II research reactor in Munich. Off-specular scattering allows us to deduce the magnetic domain structure as function of the external field. The results will be discussed in comparison to the magnetic behaviour on lager scales measured with MOKE, and compared with earlier works.