Berlin 2008 – wissenschaftliches Programm

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MM: Fachverband Metall- und Materialphysik

MM 19: SYM Thin Film Magnetic Materials: Microstructure, Reaction and Magnetic Coupling II

MM 19.1: Hauptvortrag

Dienstag, 26. Februar 2008, 11:30–12:00, H 0107

Atom Probe Characterization of Magnetic Thin Film Structures — •David Larson — Imago Scientific Instruments, Madison, WI USA

Improvements in the properties of nanoscale devices based on giant magnetoresistance or tunnel magnetoresistance depend on the capabilities of researchers to design, fabricate, and test such devices. Optimization of these capabilities are intimately tied to the feedback provided by the quality and quantity of available microscopic characterization. This work presents examples of the use of atom probe tomography to investigate microstructure for a variety of nanomagnetic thin film structures including multilayers, spin valves and tunnel barriers. Examples of interface characterization methods including a discussion of buried interface "roughness" will be given. Comparison of interfacial nature of experimental atom probe data and molecular dynamics simulation of thin film growth of a CoFe/Cu layered structures will also be presented.