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Q: Fachverband Quantenoptik und Photonik
Q 44: Quanteneffekte (Interferenz / Sonstige)
Q 44.9: Talk
Thursday, March 13, 2008, 16:00–16:15, 2D
Resonant Interferometric Lithography beyond the Diffraction Limit — •Jörg Evers1, Martin Kiffner1, and M. Suhail Zubairy1,2 — 1Max-Planck-Institut für Kernphysik, Heidelberg — 2Institute for Quantum Studies and Department of Physics, Texas A&M University, USA, and Texas A&M University at Qatar
A fundamental limit to the spatial resolution of the interferometric lithography with classical uncorrelated light arises due to diffraction. To overcome this limit, several schemes have been proposed to improve the spatial resolution of interferometric lithography beyond the diffraction limit. These schemes are based on an N-photon absorption process and achieve a spatial resolution of λ/(2N), where λ is the wavelength of the light. The indispensable requirement of a multiphoton transition, however, is accompanied by the need for high light field intensities which makes an experimental realization of these schemes impractical.
Here, we present a novel approach for the generation of subwavelength structures in interferometric optical lithography which only comprises resonant atom-field interactions, such that no multiphoton absorber is required [1]. Our scheme relies on the preparation of the system in a position dependent trapping state via phase shifted standing wave patterns. The contrast of the induced pattern does only depend on the ratios of the applied field strengths such that our method in principle works at arbitrarily low laser intensities.
[1] M. Kiffner, J. Evers, and M. S. Zubairy, submitted