Dresden 2009 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 1: Thin Film Characterisation: Structure Analyse and Composition (XRD, TEM, XPS, SIMS, RBS, ...) I
DS 1.2: Vortrag
Montag, 23. März 2009, 10:30–10:45, GER 37
Sputter deposition of vanadium pentoxide (V2O5) as electrode material in rechargable Li-ion batteries — •Tobias Gallasch, Tobias Stockhoff, and Guido Schmitz — Institut für Materialphysik, Westf. Wilhelms-Universität Münster , Wilhelm-Klemm-Str.10, 48149 Münster, Germany
V2O5 is a candidate as intercalation compound for rechargable Li-ion batteries due to its orthorhombic layered crystal structure, which allows reversible Li+ intercalation. V2O5 thin films (thickness: 300nm) were deposited on silicon or glass substrates by ion beam sputtering from a sintered V2O5 powder target. The influence of different sputter parameters (such as: substrate material, temperature, oxygen partial pressure) and post-annealing conditions on the structure were investigated by XRD and TEM; Electronic properties were analysed by dc-conductivity measurements. It is demonstrated that the desired intercalation structure is only achieved by adding oxygen during sputtering and post-annealing under oxygen atmosphere. It is shown that the electronic conductivity spreads over several orders of magnitude depending on the preparation conditions.
Futhermore, electron energy-loss spectroscopy (EELS) was carried out to determine the V-oxidation state in dependence on sputter parameters and a comparison to well-defined powder materials is given. In first experiments using a liquid electrolyte (LiClO4 as salt solved in ethylene carbonate/dimethyl carbonate mixtures) the efficiency of the sputtered V2O5 films for Li storage is demonstrated.