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Dresden 2009 – scientific programme

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DS: Fachverband Dünne Schichten

DS 13: Thin Film Metrology for Electronics, Photonics, and Photovoltaics I

Tuesday, March 24, 2009, 10:30–12:00, GER 38

10:30 DS 13.1 Topical Talk: Metrologie der Mikro- und Nanostrukturen mittels Rastersondenmikroskopie — •Teodor Gotszalk
11:00 DS 13.2 Utilizing near-field and depolarization effects for tip-enhanced Raman spectroscopy on semiconductor nanostructures — •Peter Hermann, Zhijiat Chong, Michael Hecker, Phillip Olk, Martin Weisheit, Jochen Rinderknecht, Yvonne Ritz, Peter Kücher, and Lukas M. Eng
11:15 DS 13.3 Strain analysis of embedded SiGe structures by Raman spectroscopy and FEM modelling — •Marek Roelke, Michael Hecker, Yvonne Ritz, Ehrenfried Zschech, and Victor Vartanian
11:30 DS 13.4 Electromigration simulation for on-chip Cu interconnects — •Matthias Kraatz, Dieter Schmeisser, Ehrenfried Zschech, and Paul S. Ho
11:45 DS 13.5 Metrology of nano-thin films by use of atomic force acoustic microscopy — •Malgorzata Kopycinska-Müller, Andrey Striegler, Arnd Hürrich, Bernd Köhler, Norbert Meyendorf, and Klaus-Jürgen Wolter
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