Dresden 2009 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 18: Layer Properties: Electrical, Optical and Mechanical Properties II
DS 18.5: Vortrag
Mittwoch, 25. März 2009, 12:15–12:30, GER 37
Mechanical characterization of glancing angle deposited Si Nanostructures — •André Mießler1, Christian Patzig1, Bernd Rauschenbach1, and Bodo Fuhrmann2 — 1Leibniz Institute of Surface Modification, Permoserstraße 15, 04318 Leipzig, Germany — 2Martin-Luther-Universität Halle, Heinrich-Damerow-Straße 4, 06120 Halle, Germany
In physical vapour deposition processes the incoming particle flux strikes perpendicular to the surface, whereas a compact film is deposed on the substrate. However, at the glancing angle deposition (GLAD) process the sample is tilted with respect to the substrate normal, so the particle flux strikes the surface under an highly oblique angle β (typically β > 80° with respect to the substrate normal). Self-shadowing of the deposed particles lead to a non-closed and highly porous film, which is compose of needle-like nanostructures, toward the incoming particle flux. By means of substrate rotation, different structures such as pillars, zigzags, screws or spirals can be obtained.
Although in recent years a series of fundamentally findings have been published, mechanical properties remain unknown. Our goal was to determine the mechanical properties (such as hardness, Young's Modulus and spring constants of spiral structures) by employing nanoindentation with a flat punch to these 3D silicon nanostructures.