Dresden 2009 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 22: Organic Thin Films II
DS 22.6: Vortrag
Mittwoch, 25. März 2009, 12:30–12:45, GER 38
Hierarchy of adhesion forces in patterns of photoreactive surface layers — •Quan Shen1, Nurdogan Gürkan1, Gregor Hlawacek1, Christian Teichert1, Alexandra Lex2, Gregor Trimmel2, and Wolfgang Kern3 — 1Institute of Physics, University of Leoben, 8700 Leoben, Austria — 2Institute of Chemistry and Technology of Organic Materials, Graz University of Technology, 8010 Graz, Austria — 3Institute of Chemistry of Polymeric Materials, University of Leoben, 8700 Leoben, Austria
In this contribution we focus on the investigation of ultrathin layers of the new photosensitive molecule trimethoxy[4-(thiocyanatomethyl)phenyl] silane. The photosensitive tail group, benzyl thiocyante, undergoes a photoisomerization to the corresponding isothiocyanate upon illumination with UV light. The illuminated regions can now react with amines to give regions with modified surface properties.
By illumination through a contact mask and subsequent modification, photochemically patterned surfaces are achieved [1]. Friction Force Microscopy (FFM) is used to distinguish between the chemically different areas in the pattern. Indeed, a significant friction contrast between up to four different tail groups is observed simultaneously on the same sample [2].
Supported by Austrian Science Fund FWF NFN projects S9702-N08, S9707-N08.
[1] A. Lex, et al., Chem. Mater. 20, 2009-2015 (2008).
[2] G. Hlawacek, et al., arXiv:0810.2625v1 [cond-mat.mtrl-sci].