Dresden 2009 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 25: Organic Thin Films V
DS 25.1: Vortrag
Mittwoch, 25. März 2009, 18:00–18:15, GER 37
Controlled Surface Modification by Electrospray Ion Beam Deposition: Coverage, Homogeneity and Soft Landing Energy — •Stephan Rauschenbach1, Nicha Thontasen1, Zhitao Deng1, Ralf Vogelgesang1, Nikola Malinowski1,4, Jürgen Gerlach3, and Klaus Kern1,2 — 1Max-Planck-Institut für Festkörperforschung, Heisenbergstrasse 1, D-70569 Stuttgart, Germany — 2Institut de Physique des Nanostructures, Ecole Polytechnique Fèdèrale de Lausanne, CH-1015 Lausanne, Switzerland — 3Leibniz-Institut für Oberflächenmodifizierung e. V., Permoserstr. 15, D-04318 Leipzig, Germany — 4Central Laboratory of Photographic Processes, Bulgarian Academy of Sciences, 1113 Sofia, Acad. G. Bonchev St., Bl. 109, Bulgaria
The soft landing ion beam deposition (IBD) of Rhodamine dye molecules on solid surfaces in high vacuum is investigated with the goal to fabricate molecular nanostructures from non-volatile molecules for in-situ analysis. Molecular ion beams created by electrospray ionization with controlled composition and energy are deposited on SiOx surfaces. Fluorescence spectroscopy and time-of-flight secondary-ion-mass-spectrometry (TOF-SIMS) are employed in order to characterize the sample with respect to coverage, homogeneity and soft landing ratio. We find that homogeneous films of material can be produced at energies of 2-75 eV. The coverage is found to be proportional to the ion dose and soft landing is found for energies up to 24 eV.