Dresden 2009 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 26: Poster II

DS 26.27: Poster

Mittwoch, 25. März 2009, 09:30–12:30, P5

Condensation of silicon monoxide studied by infrared spectroscopy — •Steffen Wetzel, Markus Klevenz, Elin Granas, and Annemarie Pucci — Kirchhoff-Institut für Physik der Universität Heidelberg, INF 227, 69120 Heidelberg

Silicon oxides are materials of big interest from microelectronics to astronomy; their dielectric properties determine emission spectra of stellar objects and the use as insulators in semiconductor industry. The condensation and annealing processes of silicon monoxide (SiO) under ultra-high vacuum (UHV) conditions have been studied in situ by infrared (IR) spectroscopy. The optical properties obtained from transmission and reflectance measurements will be presented and compared to the latest literature data. Upon annealing a temperature and time dependent shift of the main vibrational frequency was observed which will be discussed in detail.

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