Dresden 2009 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 28: Nanoengineered Thin Films I

DS 28.6: Vortrag

Donnerstag, 26. März 2009, 10:45–11:00, GER 37

A novel nanocomposite thin film deposition tool using plasma processes — •Ralph Schmittgens¹, Marcus Wolf¹, and Eberhard Schultheiss^1,2 — ¹Institut für Festkörperelektronik, Technische Universität Dresden — ²Fraunhofer FEP, Dresden

Nanocomposites are a novel class of materials with a lot of promising applications. Many applications require the use of nanocomposites as thin films. Vacuum based deposition processes are specially suited to produce high quality thin films. In this work a novel vacuum deposition system is presented that allows a versatile deposition of thin film nanocomposites by incorporating inorganic nanoparticles into matrix materials made of plasmapolymers or inorganic composites. The system consists of a gas phase condensation process for the nanoparticle fabrication using a hollow cathode discharge for the atomic vapor production and a very high frequency driven plasma for the deposition of the matrix materials. The design of the experimental setup allows the combination of metal, alloy and inorganic filler materials and polymeric and inorganic matrix materials. In this contribution details of the system concept and realization will be presented. Results of the characterization of copper nanoparticle size, size distribution and deposition rate will be demonstrated. Examples of the matrix film deposition process will be presented in the form of hydrophobic polymeric and titanium and silicon oxide coatings. First results of the nanoparticle incorporation of copper and copper oxide nanoparticles into plasmapolymer and inorganic matrices will be shown and possible applications discussed.