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Dresden 2009 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 3: Layer Deposition Processes

Montag, 23. März 2009, 15:45–17:15, GER 37

15:45 DS 3.1 Growth of carbon nanotubes on different support/catalyst systems for interconnect and sensor applications — •Sascha Hermann, Ramona Ecke, Barbara Pahl, and Stefan E. Schulz
16:00 DS 3.2 Vapor--liquid--solid growth of silicon on glass — •Robert Heimburger, Nils Deßmann, Thomas Teubner, Rainald Mientus, and Torsten Boeck
16:15 DS 3.3 Epitaxial Growth of Ni on Si(100) Substrate by DC Magnetron Sputtering — •Wolfgang Kreuzpaintner, Michael Störmer, Dieter Lott, Danica Solina, and Andreas Schreyer
16:30 DS 3.4 Sputtering of TiO2 under PEM-control — •Dieter Mergel, Farhad Mohtascham, and Özgür Aktas
16:45 DS 3.5 Process Conditions for Atomic Layer Deposition of HfO2 from Alkylamides and Consequences for Reactor Design — •Thomas Zilbauer, Torsten Sulima, and Ignaz Eisele
17:00 DS 3.6 Preparation of thin biaxial strained functional oxides and multilayers — •Sascha Trommler, Thomas Freudenberg, Ruben Hühne, Bernhard Holzapfel, and Ludwig Schultz
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DPG-Physik > DPG-Verhandlungen > 2009 > Dresden