Dresden 2009 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 31: Application of Thin Films II
DS 31.1: Vortrag
Donnerstag, 26. März 2009, 16:15–16:30, GER 37
Development of multilayer optics for modern X-ray analytics — •Steffen Kroth1, Jörg Wiesmann1, Frank Hertlein1, Carsten Michaelsen1, and Michael Störmer2 — 1Incoatec GmbH, Max-Planck-Strasse 2, 21502 Geesthacht — 2GKSS Forschungszentrum, Max-Planck-Strasse 1, 21502 Geesthacht
In this contribution, we give an overview on the state-of-the-art beam-shaping multilayer and total reflection optics for XRD in the lab and for synchrotron beamlines. Nowadays a large variety of 1D and 2D optics are available with optimized properties for the customer's applications. We explain the manufacturing process of multilayer and total reflection optics, summarize the different type of optics and give some examples of typical applications. The optics for lab-instrumentation consist of bent substrates with shape tolerances below 100nm, upon which multilayers are deposited with single layer thicknesses in the nm-range and up to several hundreds of layer pairs. Most multilayers were designed with lateral thickness gradients within 1% deviation of the ideal shape. This means that a deposition precision in the picometer range is needed. We use magnetron sputtering for deposition, optical profilometry in order to characterize the shape and X-ray reflectometry to characterize the multilayers. The microstructure is investigated by TEM. The beam parameters like monochromaticity, flux, brilliance and divergence demonstrate the quality of the multilayer optics for different lab applications.