Dresden 2009 – wissenschaftliches Programm
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HL: Fachverband Halbleiterphysik
HL 5: Photovoltaic
HL 5.6: Vortrag
Montag, 23. März 2009, 11:45–12:00, POT 151
3D photonic crystal interlayers for mircomorph thin film silicon tandem cell — Andreas Bielawny1, •Johannes Üpping1, Paul T. Miclea1, Ralf B. Wehrspohn1, Carsten Rockstuhl2, Falk Lederer2, Marius Peters3, Lorenz Steidl4, Rudolf Zentel4, Seung-Mo Lee5, Mato Knez5, Andreas Lambertz6, and Reinhard Carius6 — 1Institute of Physics, mikroMD, University of Halle Wittenberg — 2Institue of Physics, Solid States Optics, University of Jena — 3Freiburg Centre for Material Research, University of Freiburg — 4Dept. of Chemistry, Pharmacy and Earth Science, University of Mainz — 5Max Planck Institute of Microstructure Physics Halle — 6Institute of Energy Research, IEF-5 Photovoltaics, Forschungszentrum Jülich GmbH
The concept of 3D photonic intermediate reflectors for micromorph silicon tandem cells has been investigated toward first prototype cells. The reflector enhances the absorption of spectrally selected light in the top cell and decreases the current mismatch between both junctions. Our device is an inverted opal structure made of ZnO and built using self organized nanoparticles and atomic layer deposition coating methods. This 3D photonic crystal intermediate layer is less dependent of the angle of incidence than other state of the art thickness dependent massive interlayers. We present design rules, preparation and characterization of a 3D photonic thin film device. A first prototype is compared to a state of the art reference silicon tandem cell.