Dresden 2009 – wissenschaftliches Programm
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MA: Fachverband Magnetismus
MA 40: Poster II: Bio- and Molecular Magnetism (1-9); Magnetic Coupling Phenomena/Exchange Bias (10-15); Magnetic Particlicles and Clusters (16-29); Micro and Nanostructured Magnetic Materials (30-51); Multiferroics (52-64); Spin Injection in Heterostructures (65-67); Spin-Dyn./Spin-Torque (68-93); Spindependent Transport (94-108)
MA 40.41: Poster
Freitag, 27. März 2009, 11:00–14:00, P1A
Soft x-ray holography of FIB nanostructured Co/Pt multilayers — •Daniel Stickler1, Robert Frömter1, Christian Menk1, Holger Stillrich1, Carsten Tieg2, Simone Streit-Nierobisch3, Christian Gutt3, Lorentz-M. Stadler3, Olaf Leupold3, Gerhard Grübel3, and Hans Peter Oepen1 — 1Institut für Angewandte Physik, Universität Hamburg, Jungiusstr. 11 A, 20355 Hamburg, Germany — 2European Synchrotron Radiation Facility (ESRF), 38043 Grenoble, France — 3Deutsches Elektronen-Synchrotron (DESY), Notkestr. 85, 22607 Hamburg, Germany
Focused Ion Beam (FIB) milling is a powerful tool to produce ordered magnetic nanostructures. However, it is impossible to produce out-of-plane magnetized nanoscale structures from multilayer films by direct FIB writing. Co/Pt multilayers exhibit an out-of-plane easy axis due to strong perpendicular interface anisotropy. The interface contribution is known to be very sensitive to high energy ion irradiation. In case of 30 keV Ga ions it needs less than one ion per 100 surface atoms to destroy the perpendicular interface anisotropy. We demonstrate how this problem can be overcome by milling a Co/Pt multilayer, which has been deposited on a SiN membrane, from the rear side, through the SiN. The effect of the ions is determined as a function of applied dose utilizing the domain structure imaged by soft x-ray holography. When the magnetic material is removed we find only a very narrow range of destruction around the holes in contrast to the observations when milling from the Co/Pt side. This behaviour can be explained by the shielding of the halo of the ion beam by the SiN membrane.