Dresden 2009 – wissenschaftliches Programm

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MM: Fachverband Metall- und Materialphysik

MM 35: Poster Session II

MM 35.17: Poster

Mittwoch, 25. März 2009, 16:30–18:30, P4

Surface topography evolution during ion beam sputtering of Cu — •Maria Lenius¹, Reiner Mönig², and Cynthia A. Volkert¹ — ¹Institut für Materialphysik, Georg-August-Universität Göttingen — ²Institut für Materialforschung II, Forschungszentrum Karlsruhe

Ion beam sputtered surfaces develop complex patterns that are controlled by the interplay of various mechanisms such as surface diffusion, surface energy minimization, and shadowing effects. The pattern evolution is not fully understood, particularly in crystalline materials where literature investigations on low index Cu surfaces have revealed the importance of crystal orientation in addition to temperature, ion flux and dose.

In this study, the sputter erosion profiles of Cu grains with different crystal orientations have been investigated as a function of 30 keV Ga ion beam incidence and dose in a focused ion beam microscope. The resulting patterns (ripples, 'leaf' structure, or craters with length scales from 10 nm to 1 um) were characterized using SEM, AFM, and EBSD and depend on both crystal orientation and ion beam incidence. A comparison with the faceted structures of thermally annealed Cu surfaces will be performed to understand the role of surface energy on pattern formation. The final goal is to understand which mechanisms control pattern evolution at sputtered crystal surfaces.