Dresden 2009 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 18: Metal substrates: Adsorption of organic / bio molecules III

O 18.2: Vortrag

Dienstag, 24. März 2009, 10:45–11:00, SCH A118

Irradiation-promoted exchange reaction as a tool for Chemical Lithography — Nirmalya Ballav¹, Andreas Terfort², and •Michael Zharnikov¹ — ¹Angewandte Physikalische Chemie, Universität Heidelberg, D-69120 Heidelberg, Germany — ²Institut für Anorganische und Analytische Chemie, Goethe-Universität Frankfurt, 60438 Frankfurt, Germany

The development of novel approaches for the fabrication of nanostructures and, in particular, chemical and biological patterns is an important technological and scientific challenge. One of the perspective methods applies a modification of chemisorbed monomolecular films - self-assembled monolayers (SAMs), which are well-ordered 2D-assembles of long-chain molecules attached to a suitable substrate. A flexible molecular architecture of the SAM constituents allows one to use a wide range of substrates, whereas the molecular size of these constituents makes SAMs an ideal platform for the fabrication of micro- and nanostructures. We present here a new approach for the fabrication of chemical patterns with aliphatic SAMs as templates. The approach relies upon electron beam or X-ray lithography, but requires much lower patterning dose as compared to already available methods. The technique is based on so-called irradiation-promoted exchange reaction (IPER) between the primary SAM template and potential molecular substituent and can utilize a broad variety of commercially available molecules. The preparation of chemical patterns occurs similar to photography: in the first step the pattern is written by electrons, and in the second step it is developed in the solution of the substituent.