Dresden 2009 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 19: Nanostructures at surfaces: Arrays

O 19.1: Vortrag

Dienstag, 24. März 2009, 10:30–10:45, SCH A215

Fabrication of periodic templates on Si: from nanometer to micrometer scale — •Christian Pfahler1, Fabian Enderle1, Achim Manzke1, Stefan Wiedemann1, Alfred Plettl1, Paul Ziemann1, Eyk Schreiber2, Ulrich Ziener2, and Katharina Landfester21Institut für Festkörperphysik, Universität Ulm, D-89069 Ulm — 2Institut für Organische Chemie III, Universität Ulm, D-89069 Ulm

Colloidal polystyrene (PS) particles either pure or loaded with a metal precursor are used to generate nanomasks on Si and SiO2. The latter ones where prepared by emulsion techniques [1,2]. Dip-coating a pre-treated substrate permits the deposition of monolayers over areas up to ten square millimeters.
Isotropic etching in oxygen plasmas reduces the diameter of the pure particles continuously down to 50 nm and the emulsion colloids to hybrid particles with 20-50 nm, respectively. Typical starting values in both cases are 300 nm. Additional annealing further reduces the Pt particles to diameters between 6-14 nm.
Using this set of particles as a mask for anisotropic reactive ion etching (RIE), arrays of pillars and pores can be fabricated with variable distance and size from 10 nm up to the classical colloidal lithography scale.
0pt[1] A. Manzke et al., Adv. Mater. 19, 1337 (2007).
[2] E. Schreiber et al., Chem. Mater. submitted (2008).

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