Dresden 2009 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 27: Poster Session I (Methods: Scanning probe techniques; Methods: Atomic and electronic structure; Methods: Molecular simulations and statistical mechanics; Oxides and Insulators: Clean surfaces; Oxides and Insulators: Adsorption; Oxides and Insulators: Epitaxy and growth; Semiconductor substrates: Clean surfaces; Semiconductor substrates: Epitaxy and growth; Semiconductor substrates: Adsorption; Nano- optics of metallic and semiconducting nanostructures; Electronic structure; Methods: Electronic structure theory; Methods: other (experimental); Methods: other (theory); Solutions on surfaces; Epitaxial Graphene; Surface oder interface magnetism; Phase transitions; Time-resolved spectroscopies)
O 27.92: Poster
Dienstag, 24. März 2009, 18:30–21:00, P2
Electrospray Ion Beam Deposition and in-situ Analysis of Functional Molecules — •Zhitao Deng1, Nicha Thontasen1, Christian Michaelis1, Nikola Malinowski1, Stephan Rauschenbach1, and Klaus Kern1,2 — 1Max-Planck-Institut für Festkörperforschung, Heisenbergstrasse 1, D-70569 Stuttgart, Germany — 2Institut de Physique des Nanostructures, Ecole Polytechnique Fédérale de Lausanne, CH-1015 Lausanne, Switzerland
An electrospray ion beam deposition source has been developed for the soft landing deposition in ultra high vacuum of nonvolatile particles such as molecules, clusters and nanoparticles. This enables the surface modification and subsequent in-situ analysis by scanning tunneling microscopy. This poster presents the experimental aspects of ion beam deposition in UHV and gives examples for its application to functional molecules.