Dresden 2009 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 40: Methods: Scanning probe techniques I
O 40.7: Vortrag
Mittwoch, 25. März 2009, 16:30–16:45, SCH A316
Intrinsic and extrinsic corrugation of monolayer graphene deposited on SiO2 — •Viktor Geringer1, Marcus Liebmann1, Tim Echtermeyer2, Sven Runte1, Matthias Schmidt1, Reinhard Rückamp1, Max Lemme2, and Markus Morgenstern1 — 1II. Physikalisches Institut, RWTH Aachen and JARA-FIT, Otto- Blumenthal-Straße, 52074 Aachen — 2Advanced Microelectronic Center Aachen (AMICA), Otto-Blumenthal-Straße 25, 52074 Aachen
Using scanning tunneling microscopy (STM) in ultra high vacuum and
atomic force microscopy, we investigate the corrugation of graphene
flakes deposited by exfoliation on a Si/SiO2 surface.
While the corrugation on SiO2 is long-range with a correlation
length of about 25 nm, some of the graphene monolayers exhibit an
additional corrugation with a preferential wave length of about
15 nm. A detailed analysis shows that the long range corrugation of
the substrate is also visible on graphene, but with a reduced
amplitude, leading to the conclusion that the graphene is partly
freely suspended between hills of the substrate. Thus, the intrinsic
rippling observed previously on artificially suspended graphene can
exist as well, if graphene is deposited on SiO2 [1].
J. C. Meyer, A. K. Geim, M. I. Katsnelson, K. S. Novoselov, T. J. Booth, and S. Roth, Nature 446, 60 (2007).