Dresden 2009 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 42: Poster Session II (Nanostructures at surfaces: arrays; Nanostructures at surfaces: Dots, particles, clusters; Nanostructures at surfaces: Other; Nanostructures at surfaces: Wires, tubes; Metal substrates: Adsorption of O and/or H; Metal substrates: Clean surfaces; Metal substrates: Adsorption of organic/bio moledules; Metal substrates: Solid-liquid interfaces; Metal substrates: Adsorption of inorganic molecules; Metal substrates: Epitaxy and growth; Heterogeneous catalysis; Surface chemical reactions; Ab-initio approaches to excitations in condensed matter; Organic, polymeric, biomolecular films– also with adsorbates; Particles and clusters)
O 42.11: Poster
Mittwoch, 25. März 2009, 17:45–20:30, P2
Epitaxial Growth of Boron Nitride on a Rh-YSZ-Si(111) Multilayer System: Formation and Fine Tuning of a BN NanoMesh by Substrate Effects — •Frank Müller1, Hermann Sachdev2, and Stefan Hüfner1 — 1Institut für Experimentalphysik, Universität des Saarlandes, 66041 Saarbrücken — 2Institut für Anorganische Chemie, Universität des Saarlandes, 66041 Saarbrücken
The expitaxial growth of boron nitride on the surface of a Rh-YSZ-Si(111) multilayer system by CVD of borazine (HNBH)3 was investigated by low energy electron diffraction (LEED). The formation of a (14x14) h-BN on (13x13) Rh superstructure was observed, which is different in size from an already reported (13x13) h-BN on (12x12) Rh(111) superstructure grown on a Rh(111) single crystal substrate ("h-BN nanomesh"). We found hints that differences between the thermal expansion behaviour of the multilayer substrates and the single crystal substrate can be the reason for the formation of different sized superstructures [1].
[1] F. Müller, S. Hüfner, H. Sachdev, Surf. Sci. in press (doi:10.1016/j.susc.2008.10.033)