Dresden 2009 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 42: Poster Session II (Nanostructures at surfaces: arrays; Nanostructures at surfaces: Dots, particles, clusters; Nanostructures at surfaces: Other; Nanostructures at surfaces: Wires, tubes; Metal substrates: Adsorption of O and/or H; Metal substrates: Clean surfaces; Metal substrates: Adsorption of organic/bio moledules; Metal substrates: Solid-liquid interfaces; Metal substrates: Adsorption of inorganic molecules; Metal substrates: Epitaxy and growth; Heterogeneous catalysis; Surface chemical reactions; Ab-initio approaches to excitations in condensed matter; Organic, polymeric, biomolecular films– also with adsorbates; Particles and clusters)

O 42.22: Poster

Mittwoch, 25. März 2009, 17:45–20:30, P2

Laser induced backside wet etching of transparent materials with ultrashort laser pulses — •Martin Ehrhardt and Klaus Zimmer — Leibnitz-Institut für Oberflächenmodifizierung, Leipzig

The surface micro structuring of transparent dielectric materials with lasers can achieved by direct laser ablation using VUV - wavelength or ultrashort pulses. Another approach to structuring these materials are indirect laser processing methods. Such methods use an enhanced absorption at interface of the material which can achieved by an additional liquid, temporary plasma or absorption layer. At LIBWE (Laser induced backside wet etching) the backside of the transparent material is immersed to an absorbing liquid. That results in an intense energy deposition near the interface. For LIBWE with ns laser pulse the influence of several process parameter on e.g. etch rate, surface morphology were investigated detailed by Zimmer et al for a number of materials. However, for an improve understanding of the involved time processes an investigation of the influence of the pulse length for e.g. etch rate and surface morphology is important. In this presentation we will show recent results of the investigation of fused silica etched by LIBWE with ultrashort pulses. In particular the influence of the laser fluence and pulse number of the etch characteristic were investigate detailed und discussed. Furthermore morphological investigations were performed on the etched surfaced by different analytic techniques to characterize the surface quality. The results will by discussed with respect to the etch model for LIBWE with ns Pulse to figure out the influence of the ultrashort pulse effects of the etching process.