Dresden 2009 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe
O: Fachverband Oberflächenphysik
O 51: Surface chemical reactions I
O 51.8: Vortrag
Donnerstag, 26. März 2009, 18:00–18:15, SCH A01
The Surface Selective Chlorination of RuO2(110) — •Jan Philipp Hofmann1, Stefan Zweidinger1, Marcus Knapp1, Ari Paavo Seitsonen2, Karina Schulte3, Edvin Lundgren3, Jesper Andersen3 und Herbert Over1 — 1Physikalisch-Chemisches Institut, Justus-Liebig Universität Gießen, Heinrich-Buff-Ring 58, D-35392 Gießen — 2IMPMC, CNRS & Université Pierre et Marie Curie, 4 place Jussieu, case 115, F-75252 Paris — 3Dept. of Synchrotron Radiation Research, Lund University, Sölvegatan 14, S-22362 Lund
Chlorinated ruthenium dioxide plays an important role in the heterogeneously catalysed oxidation of hydrogen chloride to chlorine (Deacon process)[1]. High resolution core level shift spectroscopy (HRCLS) and temperature programmed reaction (TPR) experiments together with density functional theory (DFT) calculations were used to elucidate the chlorination mechanism of ruthenium dioxide RuO2(110) by hydrogen chloride exposure on the atomic scale. The surface selective chlorination proceeds via the diffusion of chlorine atoms in surface vacancies, which are formed by the desorption of water. H2O is produced either by the dissociative adsorption of HCl adjacent to a surface hydroxyl group or by the chlorine assisted recombination of two neighbouring surface hydroxyl groups [2].
[1] Crihan, D. et al.; Angew. Chemie Int. Ed. 2008, 47, 2131-2134.
[2] Hofmann, J. P.; Zweidinger, S.; Knapp, M.; Seitsonen, A. P.; Schulte, K.; Andersen, J. N.; Lundgren, E.; Over, H.; J. Phys. Chem. C, submitted.