Dresden 2009 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 60: Post Deadline Session followed by Surface Science "get-together"
O 60.4: Vortrag
Donnerstag, 26. März 2009, 20:45–21:00, HSZ 02
Photo resist free patterning by local oxidation of Ag surfaces — •Sebastian Günther1, Robert Reichelt1, Joost Wintterlin1, Andrea Locatelli2, Miguel Niño2, Tefvik Menteş2, and Alexei Barinov2 — 1Department Chemie, Ludwig-Maximilians-Universität München, Butenandtstr. 11, 81377 München, Germany — 2Sincrotrone Trieste S.C.p.A., Area Science Park, 34012 Basovizza-Trieste, Italy
Traditional surface patterning processes usually make use of photo resists and require several preparation steps such as resist irradiation and development, etch or deposition steps and eventually lift off processes. Here, we report on a potential single step structuring process which can be used to chemically pattern Ag surface by a local oxidation reaction. In particular, we present our recent findings that low energy electron irradiation of Ag(111) or polycrystalline Ag during NO2 adsorption at 300 K induces the formation of Ag oxide. Using a spatially confined electron beam, small Ag2O spots could be grown with sharp, ~ 100 nm wide, boundaries to the non irradiated metallic surface. The structure may be written as well by photon instead of electron irradiation, which makes the use of masks possible. Since the structure size will mainly depend on the sharpness of the irradiation electron beam or of the applied masks, the observed process has the potential of a single step nanostructuring process. Temperature treatment offers an easy way to manipulate the boundary between oxide and metallic silver by steering chemical fronts.