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P: Fachverband Plasmaphysik
P 10: Poster: Plasmatechnologie
P 10.10: Poster
Tuesday, March 31, 2009, 17:30–19:30, Foyer des IfP
Local deposition of fluoro-polymer thin films from C3F8-CH4 mixtures using an atmospheric pressure plasma jet — •Andreas Vogelsang, Jan Schäfer, Rüdiger Foest, and Klaus-Dieter Weltmann — INP Greifswald e.V., Felix-Hausdorff-Straße 2, 17489 Greifswald
Miniaturized low-power atmospheric plasma jets are of increasing interest due to their capability to create discharges in a parameter range which is inaccessible for many other plasma sources. Their characteristic size, electron density, electron temperature and neutral gas temperature are such that special applications become possible in the fields of e.g. analytical chemistry, surface modification and thin film deposition. The experimental study concentrates on the deposition of (CFx)-containing films by means of a non-thermal jet at 27.17 MHz, operating with argon and small admixtures of C3F8 and CH4. The plasma source consists of a quartz capillary with two outer ring electrodes. The reactive gas mixture is introduced via a 2nd capillary downstream of the lower electrode thus reducing fragmentation in the active plasma region [1]. Film deposition is carried out under static conditions with no relative movement of source and substrate. Process parameters and deposition conditions are varied systematically and the resulting deposition profiles are analyzed (XPS and water contact angle). The results show the presence of highly crosslinked CF-composites with a steep radial contact-angle gradient of the circular structures.
[1] J. Schäfer, R. Foest et al., J. Phys. D: Appl. Phys. 41 (2008), 194010