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P: Fachverband Plasmaphysik

P 10: Poster: Theory/Modelling I

P 10.3: Poster

Dienstag, 9. März 2010, 16:00–18:00, Lichthof

The ion energy distribution in dual radio frequency collisionless CCPs — •Mohammed Shihab, Thomas Mussenbrock, and Ralf Peter Brinkmann — Ruhr-University Bochum, Institute for Theoretical Electrical Engineering, D-44780 Bochum, Germany

Low pressure capacitively coupled plasmas (CCPs) are widely used for etching and deposition of thin films in semiconductor manufacturing and processing. Although dual frequency systems were introduced in the early 1990s, there has been recently an increase interest for studying these systems due to the ability of independent control of the ion flux and ion bombardment energy. In this contribution, a Monte Carlo method is developed and applied for collisionless plasma sheath to calculate the energy distribution of bombarding ions with electrode. The ions are treated one by one from the bulk to the wall through a potential matrix, which is a tow dimensional grid matrix in time and distance. The electric field effects on the ion is calculated by the gradient of the potential in each cell. The main goal of this work is to provide a fast, flexible, and also simple code for calculating reliable ion energy distribution on substrates which allows the implementation in grid computing structures. Financial support from the Federal Ministry of Education and Research within the frame of the project " Plasma Technology Grid" is gratefully acknowledged.