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Hannover 2010 – wissenschaftliches Programm

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P: Fachverband Plasmaphysik

P 9: Poster: Plasmatechnology

P 9.6: Poster

Dienstag, 9. März 2010, 16:00–18:00, Lichthof

Deposition of nitrogen-organic thin films using an atmospheric pressure microplasma jet. — •Andreas Vogelsang, Jan Schäfer, Rüdiger Foest, and Klaus-Dieter Weltmann — Leibniz-Institut für Plasmaforschung und Technologie e.V., Greifswald, Germany

The characteristics of miniaturized low-power atmospheric plasma jets are such that special applications become possible in the fields of e.g. analytical chemistry, surface modification and thin film deposition. Processes that generate amino-group containing films are desired for biomedical applications, where thin films enhance the cell adhesion for example on coated implants [1]. Results are presented for the deposition of amino-functionalized films by means of a plasma jet operating at 27.12 MHz with argon and admixtures of Cyclopropylamine (C3H5NH2). The plasma source is characterized by two ring electrodes around two concentric arranged capillaries. The outer one consists of quartz and serves as dielectric barrier, whereas the inner capillary introduces the chemical reagent to the plasma region. Process parameters and deposition conditions are varied systematically and the resulting deposition profiles are analyzed by XPS after derivatization with TFBA. It is shown that the amino-group content depends strongly on treatment time, power of the jet and the composition of the ambient atmosphere.

[1] B. Finke, F. Luethen, K. Schröder et al., Biomaterials 28 (2007) 4521-4534

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