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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 14: Poster: Interfaces and Thin Films

CPP 14.22: Poster

Monday, March 22, 2010, 16:30–18:00, Poster C

High Aspect Ratio Constructive Nanolithography with a Photo-Dimerizable Molecule — Matthias Barczewski¹, •Alexander Förste¹, Stefan Walheim¹, Tobias Heiler¹, Alfred Blaszczyk^1,2, Marcel Mayor^1,3, and Thomas Schimmel^1,4 — ¹Institute of Nanotechnology (INT), Northern Campus, Karlsruhe Institute of Technology (KIT) — ²Department of Commodity Science, Poznan University of Economics, Poland — ³Department of Chemistry, University of Basel, Switzerland — ⁴Institute of Applied Physics, Southern Campus, Karlsruhe Institute of Technology (KIT)

A major challenge in constructive nanolithography is the preservation of the lateral resolution of a monolayer-thick template pattern while amplifying it to a structure with a thickness above 10 nm. Our approach of photoinduced, constructive, reversible nanolithography, is based on nanografting within a coumarin-derivative thiol (CDT) solution using the tip of an atomic force microscope (AFM). By photodimerization and the formation of disulfide bonds, the CDT polymerizes in a single-step process. We demonstrate the highest lateral resolution in constructive nanolithography at thicknesses above 10 nm (40nm lateral resolution at 12 nm thickness, aspect ratio: 0.3).