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DPG

Regensburg 2010 – scientific programme

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DS: Fachverband Dünne Schichten

DS 36: Thin Film Characterisation: Structure Analyse and Composition (XRD, TEM, XPS, SIMS, RBS, ...) I

DS 36.4: Talk

Thursday, March 25, 2010, 10:15–10:30, H8

RBS and resonant scattering analysis of thin oxidic films prepared by sputtering — •Dieter Mergel1, Hans-Werner Becker2, and Detlef Rogalla21Universität Duisburg-Essen, FB Physik, 47048 Duisburg — 2Ruhr-Universität Bochum, Dynamitron Tandem Labor des RUBION, 44780 Bochum

The oxygen content in various oxidic thin films has been determined from alpha scattering spectra based upon gauging with a rutile and a SrTiO3 crystal. Both RBS and scattering with the 3.04 MeV resonance (for O) were applied and compared to each other.

Main findings are:

- Gradient in O-content of TiO2 prepared by reactive magnetron sputtering at 300C at various oxygen partial pressures.

- Oxygen surplus in ITO films prepared by rf-diode sputtering.

- Variation in the oxygen content of nominal Cr2MnO4 prepared by magnetron sputtering at 350C to 650C.

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