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Regensburg 2010 – scientific programme

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DS: Fachverband Dünne Schichten

DS 46: Organic Thin Films III

DS 46.9: Talk

Friday, March 26, 2010, 16:00–16:15, H8

Direct Write 3-Dimensional Nanopatterning using Probes — •Felix Holzner1, Armin Knoll1, David Pires1, Ute Drechsler1, Michel Despont1, Heiko Wolf1, James Hedrick2, Anuja DeSilva3, and Urs Duerig11IBM Research - Zurich, Switzerland — 2IBM Research - Almaden, USA — 3IBM Research - Watson, USA

A high-resolution probe based patterning method is presented using organic resists, that respond to the presence of a hot tip by local material desorption. Thereby arbitrarily shaped patterns can be written in the organic films in the form of a topographic relief. Line gratings with a half-pitch of 15 nm have been fabricated.

Moreover, three dimensional patterns can be written by controlling the amount of material removal. The patterns can be readily transferred into silicon using standard RIE technology. The new technique offers a cost-effective and competitive alternative to high-resolution electron-beam lithography in terms of both resolution and speed.

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