Dresden 2011 – wissenschaftliches Programm
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 23: Poster: Semicrystalline Polymers, Polymer Crystallization and Self-Assembly
CPP 23.13: Poster
Dienstag, 15. März 2011, 18:00–20:00, P2
Monolayer Patterns for Templated Self-Assembly of ZnO Films with Nanoscale Resolution — •Svetlana Khasminskaya1, Armin Müller1, Jiehong Jin1, Cheng Huang1, Jorg Pfeifer1, Luciana Pitta Bauermann3,4, Peter Gerstel3,4, Joachim Bill3, 4, Stefan Walheim1, 2, and Thomas Schimmel1, 2 — 1Karlsruhe Institute of Technology (KIT), Institute for Nanotechnology (INT), Karlsruhe, Germany — 2Karlsruhe Institute of Technology (KIT), Institute of Applied Physics and Center for Functional Nanostructures (CFN), Karlsruhe — 3Institute for Materials Science, Universität Stuttgart, Germany — 4Max-Planck-Institute for Metals Research, Stuttgart
Lithographically defined self-growing ZnO films were prepared by a bioinspired chemical bath deposition technique (CBD). We observed a high selectivity of ZnO deposition: Teflon-like per-fluoro-decyl-trichlorosilane (FDTS) monolayers repelled ZnO primary particles, whereas amino-functionalized areas of the substrate were selectively covered by a highly anisotropic, oriented, and compact ZnO film with a thickness of 50 nm. The size of the primary particles in our methanol-based solution was approximately 2.5 nm. On the amino substrate they formed agglomerates not larger than 30 nm. Monolayer patterns made by polymer blend lithography were templated with an edge resolution of 30 nm.[1].
[1] L. Pitta Bauermann et al.; Langmuir, 2010, 26 (6), pp 3774-3778