Dresden 2011 – wissenschaftliches Programm
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 35: Poster: Micro- and Nanofluidics
CPP 35.10: Poster
Mittwoch, 16. März 2011, 17:00–19:00, P2
Static Wetting Morphologies in Topographically Structured Substrates — •Stefan Bommer1, Dominik Michler2, Martin Brinkmann2, and Ralf Seemann1,2 — 1Saarland University, Saarbrücken, Germany — 2MPI DS, Göttingen, Germany
The different wetting morphologies of liquid confined to micron sized trapezoidal grooves are studied experimentally and theoretically. We explore the emerging equilibrium morphologies as function of groove wettability and groove aspect ratio, i.e. the ratio of groove depth to groove width. The grooves are fabricated in silicon by wet etching, whereas the slope of the side walls is given by the crystal lattice of the silicon. The wettability of the substrate is controlled by various self-assembly monolayers and fine tuned with a subsequent oxygen plasma treatment. The wetting morphologies consist of polystyrene deposited from the gas phase and imaged by scanning force microscopy in an intermitted mode. Morphology diagrams are derived analytically by minimizing the surface free energies and compared to the experimental results.