Dresden 2011 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

CPP: Fachverband Chemische Physik und Polymerphysik

CPP 36: Poster: Nanoparticles and Composite Materials

CPP 36.3: Poster

Mittwoch, 16. März 2011, 17:00–19:00, P2

Freestanding membranes with well defined nanopores — •Achim Manzke, Martin Keitsch, Fabian Enderle, Stefan Wiedemann, Alfred Plettl, and Paul Ziemann — Institute of Solid State Physics, Ulm University, D-89069 Ulm

SiO2-membranes homemade from SiO2-Si-wafers or commercial Si3N4-membranes are used as starting material. Unconventional micellar and colloidal lithography techniques are used to generate hexagonal arrays of Au and Pt nanoparticles on the membrans surface, respectively [1, 2]. Additionally, pure polystyrene particles can be etched down in size by isotropic oxygen plasma treatments [3]. Particles from all three methods are used as masks in subsequent etching steps. Combination of plasma etching, evaporation, and Ar-ion polishing techniques leads to cylindrical pores through the membrane. The micellar technique enables pore diameters from 15 to 50 nm at distances up to 130 nm. On the other hand, the colloidal method allows the fabrication of pores with diameters from 40 nm to micrometers at widely variable distances. Hence, the preparation of freestanding membranes with continuously selectable pore diameters in the nm-range will be demonstrated.

[1] G. Kästle et al., Adv. Funct. Mat. 13, 853 (2003)

[2] A. Manzke et al., Adv. Mater. 19, 1337 (2007)

[3] A. Plettl et al., Adv. Funct. Mat. 19, 3279 (2009)