Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
DS: Fachverband Dünne Schichten
DS 11: Thin Film Characterisation: Structure Analysis and Composition (XRD, TEM, XPS, SIMS, RBS, ...) IV
DS 11.2: Vortrag
Montag, 14. März 2011, 16:00–16:15, GER 38
XPS depth profiling on polymers using Ar, C60, Coronene and Gas Cluster Ion Beam. — •Andrey Lyapin1, Stefan Reichlmaier1, John S. Hammond2, John F. Moulder2, Takuya Miyayama3, Noriaki Sanada3, Mineharu Suzuki3, and Atsushi Takahara4 — 1Physical Electronics GmbH, 85737 Ismaning, Germany — 2Physical Electronics USA, 18725 Lake Drive East, Chanhassen, MN. 55317 USA — 3ULVAC-PHI, Inc., 370 Enzo, Chigasaki, Kanagawa, 253-8522 Japan — 4Kyushu University, Motooka, Nishi-ku, Fukuoka 8190395 Japan
The use of cluster ion sputtering for depth profiling of polymers, organics, and biomaterials has opened an entirely new field of application for surface analytical methods and shown potential to analyze chemical bonding and molecular structures during sputtering into a sample surface. In this talk we present a comparison of the use of XPS depth profiling of thin polymer films with Ar, C60, Coronene and Ar Gas Cluster Ion Beam (GCIB) sputter sources. The GCIB sputter source produces an Ar2500+ ion beam with user definable incident beam energy. Optimized conditions for the incident ion beam energy of the GCIB will be presented to provide minimal chemical state damage during the depth profiling. Results will also be presented showing that the GCIB source can be used to remove damaged layers from modified surfaces.