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Dresden 2011 – scientific programme

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DS: Fachverband Dünne Schichten

DS 12: Layer Deposition Processes

Monday, March 14, 2011, 17:15–18:30, GER 38

17:15 DS 12.1 A growth model for the HfO2 ALD process — •Marcel Michling, Massimo Tallarida, Krzysztof Kolanek, and Dieter Schmeißer
17:30 DS 12.2 Atomic layer deposition of TiO2 — •Massimo Tallarida, Nils Deßmann, Matthias Städter, Daniel Friedrich, Marcel Michling, and Dieter Schmeißer
17:45 DS 12.3 Deposition and growth of antibacterial Ti-Cu films — •Vitezslav Stranak, Harm Wulff, Steffen Drache, Robert Bogdanowicz, Zdenek Hubicka, Carmen Zietz, Kathleen Arndt, Rainer Bader, Andreas Podbielski, and Rainer Hippler
18:00 DS 12.4 Combination of ECR plasma and asymmetric bipolar pulsed bias voltage for deposition of hard a-C:H films — •Marcus Günther, Siegfried Peter, and Frank Richter
18:15 DS 12.5 Electrical and structural properties of magnetron sputtered hydrogenated amorphous Silicon films — •Frank Nobis, Hartmut Kupfer, Evelyn Breyer, Philipp Schäfer, Dietrich R. T. Zahn, and Frank Richter
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