Dresden 2011 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 42: Poster I: Progress in Micro- and Nanopatterning: Techniques and Applications (jointly with O); Spins in Organic Materials; Ion Interactions with Nano Scale Materials; Organic Electronics and Photovoltaics; Plasmonics and Nanophotonics (jointly with HL and O); High-k and Low-k Dielectrics (jointly with DF); Organic Thin Films; Nanoengineered Thin Films; Layer Deposition Processes; Layer Properties: Electrical, Optical, and Mechanical Properties; Thin Film Characterisation: Structure Analysis and Composition; Application of Thin Films
DS 42.100: Poster
Mittwoch, 16. März 2011, 15:00–17:30, P1
Contamination and Cleaning of Multilayer Mirrors with X-ray Photoelectron Spectroscopy — •Sina Gusenleitner1,2, Marius Ernst1,2, Dirk Ehm2, and Friedrich Reinert3 — 1Universität Würzburg, Experimentelle Physik VII, D-97074 Würzburg, Germany — 2Carl Zeiss SMT GmbH, Rudolf Eber StraSSe 2, D-73447 Oberkochen, Germany — 3Karlsruhe Institut für Technologie (KIT), Gemeinschaftslabor für Nanoanalytik, D-76021 Karlsruhe, Germany
Extreme Ultraviolet Lithography is a promising next generation lithography technology. In this radiation regime (wavelength 13.5 nm) advanced multilayer mirrors (MLM) are used as collector and illuminator optics. The mirrors consist of a stack of alternating molybdenum and silicon layer, coated with a dedicated capping material such as Si, Ti, Mo, Pd, Ru, or their oxides. Various contamination dynamics in the lithography tool lead to formation of hydrocarbon layers on the mirror surface. In order to understand these contamination processes the adsorption, bonding and chemical environment of carbonaceous layers on MLM surfaces are investigated with X-ray Photoelectron Spectroscopy (XPS). A clean reference surface can be obtained by exposing a contaminated mirror surface to reactive species. The influence of these species on the chemical structure of the MLM surface and adsorbed carbonaceous layers was monitored with XPS. Variation of the take-off angle in XPS measurements provided information about the influence of the cleaning process on the structure of the surface, such as intermixing of the underlying layers with the capping layer material.