Dresden 2011 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 42: Poster I: Progress in Micro- and Nanopatterning: Techniques and Applications (jointly with O); Spins in Organic Materials; Ion Interactions with Nano Scale Materials; Organic Electronics and Photovoltaics; Plasmonics and Nanophotonics (jointly with HL and O); High-k and Low-k Dielectrics (jointly with DF); Organic Thin Films; Nanoengineered Thin Films; Layer Deposition Processes; Layer Properties: Electrical, Optical, and Mechanical Properties; Thin Film Characterisation: Structure Analysis and Composition; Application of Thin Films

DS 42.43: Poster

Mittwoch, 16. März 2011, 15:00–17:30, P1

Tetrazine Thin Film Growth on SAM-coated Gold Surfaces — •Dominik Meyer¹, Philip Schulz¹, Laurent Galmiche², Pierre Audebert², and Matthias Wuttig¹ — ¹Institute of Physics (IA), RWTH Aachen University of Technology, 52056 Aachen, Germany — ²P.P.S.M. (CNRS UMS 8531), École Normale Supérieure de Cachan, 61 Avenue du Président Wilson, 94235 Cachan Cedex, France

The modification of noble metal surfaces by organosulfur self-assembled monolayers (SAM) is a widely studied topic in the field of organic optoelectronics. The assembly of such monolayers alters the electronic structure of the metal surface and strongly affects thin film growth of subsequently deposited organic material employed in optoelectronic devices. Here we present the impact of SAMs on the crystal growth of 3,6-bis(3,5-dimethylpyrazol-1-yl)-1,2,4,5-tetrazine (bpytz). Tetrazines are promising candidates as alternative active materials for optoelectronic and sensor applications as they generally provide a high electron affinity. This study compares the growth of bpytz on pure Au(111) surfaces with modified gold surfaces employing decanethiol and didecyl-dithiocarbamates as self-assembling monolayers. X-ray diffraction (XRD) and Infrared (IR) spectroscopy are employed to investigate the different growth scenarios, while density functional theory (DFT) was utilized to analyze the measured IR data.